LEE S. | Silicon Nano Device Lab., National University of Singapore
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概要
関連著者
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LEE S.
Silicon Nano Device Lab., National University of Singapore
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Lee S.
Silicon Nano Device Lab Department Of Ece National University Of Singapore
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KWONG D.
Institute of Microelectronics
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KWONG D.-L.
Institute of Microelectronics
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Kwong Dim-Lee
Institute of Microelectronics
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Lo Guo-Qiang
Institute of Microelectronics
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Gao Fei
Institute Of Microelectronics
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Bera L.
Institute Of Microelectronics
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LOH Wei-Yip
Institute of Microelectronics
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CHEN YiXuan
Institute of Microelectronics
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YANG Rong
Institute of Microelectronics
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BALASUBRAMANIAN N.
Institute of Microelectronics
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KUMAR R.
Institute of Microelectronics
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TUNG C.
Institute of Microelectronics
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CHI D.
Institute of Materials Research & Engineering
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BALAKUMAR S.
Institute of Microelectronics
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SUDHIRANJAN T.
Institute of Materials Research Engineering
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FOO Y.
Institute of Materials Research Engineering
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KWONG D-L
Institute of Microelectronics
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YANG W.
Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapo
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WHANG S.
Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapo
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LIM S.
Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapo
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CHO B.
Silicon Nano Device Lab., Dept. of Electrical & Computer Engineering, National University of Singapo
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LI Rui
Silicon Nano Device Lab, Department of ECE, National University of Singapore
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HONG M.
Laser Microprocessing Lab, Department of Electrical and Computer Engineering, National University of
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Foo Y.
Institute Of Materials Research And Engineering
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Lee S.
Silicon Nano Device Lab. Dept. Of Electrical & Computer Engineering National University Of Singa
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Lee S.
Silicon Nano Device Lab. National University Of Singapore
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Li Rui
Silicon Nano Device Lab Department Of Ece National University Of Singapore
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Whang S.
Silicon Nano Device Lab. Dept. Of Electrical & Computer Engineering National University Of Singa
著作論文
- Dopant Segregated Pt-Germanide Schottky S/D p-MOSFET with HfO_2/TaN gate on Strained Si-SiGe channel
- A Novel Approach to fabricate High Ge content SiGe on Insulator from Amorphous SiGe deposited on SOI wafers
- High quality Si_Ge_x nanowire and its application to MOSFET integrated with HfO_2/TaN/Ta gate stack
- Pt-germanide Formed by Laser Annealing and Its Application for Schottky Source/Drain MOSFET Integrated with TaN/CVD-HfO_2/Ge Gate Stack