Hwang Hyunsang | Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology

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概要

• 同名の論文著者
• Department Of Materials Science And Engineering Kwangju Institute Of Science And Technologyの論文著者

関連著者

• HWANG Hyunsang

  Department of Materials Science and Engineering, Gwangju Institute of Science and Technology

• Hwang Hyunsang

  Department Of Materials Science And Engineering Gwangju Institute Of Science And Technology

• Hwang Hyunsang

  Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology

• PARK Jihwan

  Department of Materials Science and Engineering, Kwangju Institute of Science and Technology

• Park Jihwan

  Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology

• YEO In-Seok

  Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.

• Yeo In-seok

  Advanced Process Team Memory R&d Div. Hynix Semiconductor Inc.

• Lee K

  Korea Univ. Seoul Kor

• HUH Yun

  R&D Division, LG Semicon. Co., Ltd.

• Yeom H.

  Atomic-scale Surface Science Research Center Institute Of Physics&applied Physics Yonsei Univers

• Huh Yun

  R&d Division Lg Semicon Co.

• Lee Jeong-youb

  Semiconductor Research Div. Hyundai Electronics Industry

• Yang H.

  Department of Physics, Center for Nano Science and Nano Technology, National Sun Yat-sen University

• JEON S.

  Department of Materials Science and Engineering, Kwangju Institute of Science and Technology

• CHANG H.

  Department of Materials Science and Engineering, Kwangju Institute of Science and Technology

• PARK D.

  Advanced Process Team, Memory R&D Div., Hynix Semiconductor, Inc.

• LIM K.

  Advanced Process Team, Memory R&D Div., Hynix Semiconductor, Inc.

• KOH H.

  Atomic-scale Surface Science Research Center, Institute of Physics&Applied Physics, Yonsei Universit

• LEE Kilho

  Semiconductor Research Div., Hyundai Electronics Industry

• Yang H.

  Department Of Physics Center For Nano Science And Nano Technology National Sun Yat-sen University

• Yang H.

  Department Of Chemical Engineering Sogang University

• Jeon S.

  Department Of Materials Science And Engineering Kwangju Institute Of Science And Technology

• PARK D.

  Advanced Process Team, Memory R&D Div., Hynix Semiconductor, Inc.

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著作論文

• Effect of Hydrogen Partial Pressure on the Reliability Characteristics of Ultrathin Gate Oxide
• Ultrathin Nitrided-Nanolaminate (Al_2O_3/ZrO_2/Al_2O_3) for Gate Dielectrics Application
• Ultrashallow p^+/n Junction Formation by 0.5-1 keV Ion Implantation

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