Sakata Osami | Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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概要
関連著者
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Sakata Osami
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Sakata Osami
Research and Utilization Division, Japan Synchrotron Radiation Research Institute (JASRI)/SPring-8, Sayo, Hyogo 679-5198, Japan
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HASHIZUME Hiroo
Research and Education Center for Materials Science, Nara Institute of Science and Technology
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Hashizume Hiroo
Research And Education Center For Materials Science Nara Institute Of Science And Technology
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Kimura Shigeru
Research and Utilization Division, Japan Synchrotron Radiation Research Institute (JASRI)/SPring-8, Sayo, Hyogo 679-5198, Japan
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Sakata O
Tokyo Inst. Technol. Yokohama Jpn
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Azuma Masaki
Institute For Chemical Research Kyoto University
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Shimakawa Yuichi
Institute For Chemical Research Kyoto University
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Inoue Tomoyuki
Graduate School Of Engineering Yokohama National University
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Nikulin Andrei
Research Laboratory Of Engineering Materials Tokyo Institute Of Technology
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Watanabe Heiji
Graduate School Of Engineering Osaka University
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HOSOI Takuji
Graduate School of Engineering, Osaka University
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Imai Yasuhiko
Research And Development Division Kikkoman Corporation
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Kawai Masanori
Institute For Chemical Research Kyoto University
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Shimura Takayoshi
Graduate School Of Engineering Osaka University
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Kan Daisuke
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
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Sakai Maiko
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
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Inoue Satoru
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
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Shimura Takayoshi
Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Shimokawa Daisuke
Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Hosoi Takuji
Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Kawai Masanori
Institute for Chemical Research, Kyoto University, Uji, Kyoto 611-0011, Japan
著作論文
- X-Ray Evaluation of Microroughness of Mechanochemically Polished Silicon Surfaces
- Characterization of SiGe Layer during Ge Condensation Process by X-ray Diffraction Methods
- Dynamical X-Ray Diffraction Profiles for Asymmetric Reflection form Crystals under Grazing Incidence Conditions : Techniques, Instrumentations and Measurement
- Direct Observation of $B$-site Ordering in Multiferroic Bi2NiMnO6 Thin Film