Lee Jo-won | Material And Device Lab. Samsung Advanced Institute Of Technology
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概要
関連著者
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Lee Jo-won
Material And Device Lab. Samsung Advanced Institute Of Technology
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Kim Moonkyung
Material And Device Lab. Samsung Advanced Institute Of Technology
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Kim Juhyung
Material And Device Lab. Samsung Advanced Institute Of Technology
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Jeong Younseok
Material And Device Lab. Samsung Advanced Institute Of Technology
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YOON Sewook
Material and Device Lab., Samsung Advanced Institute of Technology
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PARK Byung-Gook
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering and Compu
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CHAE Soodoo
Material and Device Lab., Samsung Advanced Institute of Technology
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LEE Changju
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul Na
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SUNG Sukkang
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul Na
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SIM Jaeseong
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul Na
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RYU Wonil
Material and Device Lab., Samsung Advanced Institute of Technology
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KIM Taehun
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul Na
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KIM Chungwoo
Material and Device Lab., Samsung Advanced Institute of Technology
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Ryu Wonil
Material And Device Lab. Samsung Advanced Institute Of Technology
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Kim Taehun
Inter-university Semiconductor Research Center (isrc) And School Of Electrical Engineering Seoul Nat
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Chae Soodoo
Material And Device Lab. Samsung Advanced Institute Of Technology
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Sung Sukkang
Inter-university Semiconductor Research Center (isrc) And School Of Electrical Engineering Seoul Nat
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Kim Chungwoo
Material And Device Lab. Samsung Advanced Institute Of Technology
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Sim Jaeseong
Inter-university Semiconductor Research Center (isrc) And School Of Electrical Engineering Seoul Nat
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Lee Changju
Inter-university Semiconductor Research Center (isrc) And School Of Electrical Engineering Seoul Nat
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Kim Chungwoo
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Kim Juhyung
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Kim Moonkyung
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Kim Taehun
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul National University, College of Engineering, P.O. BOX 34, Seoul 151-742, Korea
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Park Byung-Gook
Inter-University Semiconductor Research Center (ISRC) and School of Electrical and Computer Science, Seoul National University, San 56-1, Sillim-dong, Gwanak-ku, Seoul 151-742, Republic of Korea
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Park Byung-Gook
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul National University, College of Engineering, P.O. BOX 34, Seoul 151-742, Korea
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Jeong Younseok
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Yoon Sewook
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Lee Changju
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul National University, College of Engineering, P.O. BOX 34, Seoul 151-742, Korea
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Ryu Wonil
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Chae Soodoo
Material and Device Lab., Samsung Advanced Institute of Technology, San 14 Nongseo-ri, Kihung-up, Yongin-si, Kyungki-do, Korea
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Sung Sukkang
Inter-University Semiconductor Research Center (ISRC) and School of Electrical Engineering, Seoul National University, College of Engineering, P.O. BOX 34, Seoul 151-742, Korea
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Park Byung-Gook
Inter-University Semiconductor Research Center (ISRC) and Department of Electrical Engineering and Computer Science, Seoul National University, Seoul 151-742, Republic of Korea
著作論文
- 70nm Silicon-Oxide-Nitride-Oxide-Silicon Nonvolatile Memory Devices Using Fowler-Nordheim Programming and Hot Hole Erase Method
- 70 nm Silicon-Oxide-Nitride-Oxide-Silicon Nonvolatile Memory Devices Using Fowler-Nordheim Programming and Hot Hole Erase Method