FREEDSMAN Joseph | Research center for Nano-Device and System, Nagoya Institute of Technology
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概要
関連著者
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FREEDSMAN Joseph
Research center for Nano-Device and System, Nagoya Institute of Technology
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Watanabe ARATA
Research center for Nano-Device and System, Nagoya Institute of Technology
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SELVARAJ Lawrence
Research center for Nano-Device and System, Nagoya Institute of Technology
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EGAWA Takashi
Research center for Nano-Device and System, Nagoya Institute of Technology
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Watanabe Arata
Research Center For Nano-device And System Nagoya Institute Of Technology
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Egawa Takashi
Research Center For Nano-device And System Nagoya Institute Of Technology
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Selvaraj Lawrence
Research Center For Nano-device And System Nagoya Institute Of Technology
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Freedsman Joseph
Research Center For Nano-device And System Nagoya Institute Of Technology
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Egawa Takashi
Research Center for Micro-Structure Devices, Nagoya Institute of Technology
著作論文
- A comparative study on AlGaN/GaN based HEMT and MIS-HEMT with Al2O3 as gate dielectric (Electron devices)
- A comparative study on AlGaN/GaN based HEMT and MIS-HEMT with Al_2O_3 as gate dielectric(Session 6B : Wide Bandgap Materials and Devices, Power Devices)
- A comparative study on AlGaN/GaN based HEMT and MIS-HEMT with Al_2O_3 as gate dielectric(Session 6B : Wide Bandgap Materials and Devices, Power Devices)