Li X. | Graduate School of Engineering, Tohoku University
スポンサーリンク
概要
関連著者
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Teramoto A.
New Industry Creation Hatchery Center, Tohoku University
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Sugawa S.
Graduate School of Engineering, Tohoku University
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Ohmi T.
New Industry Creation Hatchery Center, Tohoku University
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Li X.
Graduate School of Engineering, Tohoku University
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Kuroda R.
Graduate School of Engineering, Tohoku University
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Suwa T.
New Industry Creation Hatchery Center, Tohoku University
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Sugawa S.
Graduate School Of Engineering Tohoku University
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Teramoto A.
New Industry Creation Hatchery Center Tohoku University
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Ohmi T.
New Industry Creation Hatchery Center Tohoku University
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Suwa T.
New Industry Creation Hatchery Center Tohoku University
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Ohmi T.
New Industry Creation Hatchery Center Tohoku University:wpi Research Center Tohoku University
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Ohmi T.
New Industry Creation Hatchery Center, Tohoku University:WPI Research Center, Tohoku University
著作論文
- High Integrity Gate Insulator Films on Atomically Flat Silicon Surface(Session 7A : Gate Oxides)
- High Integrity Gate Insulator Films on Atomically Flat Silicon Surface(Session 7A : Gate Oxides)