Tai W. | AT&T Bell Laboratories
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概要
AT&T Bell Laboratories | 論文
- ^Pb NMR Study of BaPbO_3
- Real-Time TEM Studies of Electromigration in Submicron Aluminum Runners
- From Relaxed GeSi Buffers to Field Effect Transistors : Current Status and Future Prospects
- Proximity Effect Correction in Projection Electron Beam Lithography (Scattering with Angular Limitation Projection Electron-Beam Lithography)
- The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System