Yoshioka Yoshiaki | Central Research Laboratories, Matsushita Electric Industrial Co., Ltd.
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Central Research Laboratories, Matsushita Electric Industrial Co., Ltd. | 論文
- Characterization of Surface Conductive Diamond Layer Grown by Microwave Plasma Chemical Vapor Deposition
- Electrical Properties of Boron-Implanted Homoepitaxial Diamond Films
- Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition
- Synthesis of β-SiC Layer in Silicon by Carbon Ion 'Hot' Implantation
- β-SiC Formation by Low-Energy Ion-Doping Technique