KOMATSU Katsuhiko | NTT LSI Laboratories
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概要
NTT LSI Laboratories | 論文
- Neutral Stream Extraction from Electron Cyclotron Resonance Plasma by Using Parallel Magnetic Field
- Generation of Electron Cyclotron Resonance Neutral Stream and Its Application to Si Etching
- Influence of Reaction Products and Oxygen on Highly Selective Electron Cyclotron Resonance Ion Stream Etching of Si
- A Beam Drift Reduction Device for the X-Ray Mask E-Beam Writer, EB-X2
- Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging