山口 直洋 | Department of Electronics, Information and Communication Engineering, Waseda University
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- 山口 直洋の詳細を見る
- 同名の論文著者
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Department of Electronics, Information and Communication Engineering, Waseda University | 論文
- Effect of Ar^+ Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System
- Refractive Index Measurement of Silicon Thin Films Using Stab Optical Waveguides
- Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguides
- Oxidation Properties of Silicon Nitride Thin Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma Chemical Vapor Deposition : Surfaces, Interfaces and Films
- Microwave Plasma CVD System for the Fabrication of Thin Solid Films