Kim Dong-Sik | Department of Materials Engineering, Hanyang University
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概要
Department of Materials Engineering, Hanyang University | 論文
- Remote Plasma-Assisted Metal Organic Chemical Vapor Deposition of Tantalum Nitride Thin Films with Different Radicals
- Barrier Metal Properties of Amorphous Tantalum Nitride Thin Films between Platinum and Silicon deposited using Remote Plasma Metal Organic Chemical Vapor Method
- Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH_2Cl_2 and O_3 as the Precursors
- Highly Anisotropic Etching of Tungsten-Nitride for an X-Ray Mask Absorber with an Inductively Coupled Plasma System
- Study on the Properties of Interlayer Low Dielectric Polyimide during Cl-Based Plasma Etching of Aluminum