Ohmura Mitsuhiro | Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company
スポンサーリンク
概要
- Ohmura Mitsuhiroの詳細を見る
- 同名の論文著者
- Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Companyの論文著者
Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company | 論文
- Low Leakage TiO_2 Gate Insulator Formed by Ultrathin TiN Deposition and Low-Temperature Oxidation
- Reliable High-k TiO_2 Gate Insulator Formed by Ultrathin TiN Deposition and Low Temperature Oxidation
- Very High Selective N^+ poly-Si RIE with Carbon Elimination : Etching and Deposition Technology