Mizoguchi Tetsuhiko | Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corporation
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- 同名の論文著者
- Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corporationの論文著者
Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corporation | 論文
- Dissolution Inhibitors for 193-nm Chemically Amplified Resists
- Highty Transparent Chemically Amplified ArF Excimer Laser Resists by Absorption Band Shift for 193 nm Wavelength
- Thermal Decomposition of Dissolution Inhibitor in Chemically Amplified Resist during Prebake Process
- Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography
- Optimization of a High-Performance Chemically Amplified Positive Resist for Electron-Beam Lithography