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The Society of Photopolymer Science and Technology (SPST) | 論文
- Photochemical ODN Manipulation Based on Reversible DNA Photoligation Mediated by Modified Photoresponsive Base
- Effect of Polyethers for Photo and Thermal Decomposition of Photosensitive Diazo Compounds
- Scanning Removal of Ion-implanted Novolak Resist by using a Laser Irradiation
- Optical Density at 193nm of Vinyl Addition Poly(norbornene) Made Using Hydrogen as a Chain Transfer Agent
- In-situ Polymerization of Thiophene Derivatives Using a Gas-phase Oxidant to Form a Hole-transporting Layer in Dye-sensitized Solar Cell
- Relationship between the Thermal Hardening of Ion-Implanted Resist and the Resist Removal Using Atomic Hydrogen
- Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group
- Synthesis of Block Copolymer Based on Polyfluorenes and Application to Luminescent Materials
- Preparation and Properties of Polyimide-Clay Hybrids Containing In-situ Formed Polydimethylsiloxane
- UV-Curing of a Novolak Epoxy Resin Enhanced by a Multifunctional Base-amplifier
- Resist Removal Method using Xe2 Excimer Ultraviolet Light
- Fabrication of Multi-layer Polymer Light Emitting Diodes using a Photo Cross-linking Method
- Blue Phosphorescent Iridium(III) Complex. Aromaticity of the Triplet Potential Energy Surface
- EUV Interference Lithography for 22nm Node and Below
- Synthesis of Novel Monodispersed Dendritic Base Amplifiers to Apply to Negative-tone Photoresists
- Electron-Beam-Induced Chromism Combined with Photo- or Thermal Reverse Reaction for Color Imaging
- Multi-Functional Polymer Nanowires with Ultra-high Aspect Ratio Produced by Single Particle Nano-fabrication Technique
- The Necessity of Radicals for Gene Transfection by Discharge Plasma Irradiation
- Local Concentration of Allyl Groups at Dendrimer Surface to Improve Photosensitivity of UV Curable Materials
- The Correlation between Glass Transition Point of Dopant and Device Life of OEL