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The Society of Photopolymer Science and Technology (SPST) | 論文
- EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement
- Surface Functionalization of DLC Thin Films by Plasma Technique
- Preparation of Floating Drug Delivery System by Pulsed-Plasma Techniques
- Fabrication of Scaffold for Cell Adhesion on Plasma-irradiated Polystyrene
- Evaluation on Fluidity of the Self-Assembled Phospholipid Layer Fabricated by Plasma-Assisted Method and its Application
- The Hole Shrink Problem: Self-Consistent Field Theory for Directed Self-Assembly of Miktoarm Copolymers
- Single Crystal Organic Field-effect Transistors Based on Dinaphthothienothiophene Isomers
- Polymer-based Engineering for High-efficiency Plastic Dye-sensitized Solar Cells
- Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation
- Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film
- Progress in Spin-on Hard Mask Materials for Advanced Lithography
- Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193nm
- Study of Nano-Space in Au-Polysilane Interfaces by Slow Positron Beam
- Dynamics of Photo-Optical Effect of Azo Dyes Measured with Michelson Interferometer
- Surface Chemistry of Fluorine Lyophobic Resist
- Formation of Metal Nanoparticle/Acrylic Polymer Hybrid Film by UV-Irradiation
- Secondary Electrons in EUV Lithography
- Application of a New BARC Material for 157-nm Lithography
- Development of Noncontact Thermal Rewritable System using Laser Light
- Control of Morphology Orientation in Lithographically Patternable Diblock Copolymers