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The Conference of Photopolymer Science and Technology | 論文
- A micro-nano melt transcription molding process to produce thermoplastic devices with tens nanometers scale fine patterns
- Preparation of carbon-based catalysts for PEFC from nitrogen-containing aromatic polymers
- PEGylated polyamine nanogel as a nanoreactor of silica/gold hybrid nanoparticle preparation
- Characterizing polymer bound PAG type EUV resist
- Recent development in molecular resists for extreme ultraviolet lithography
- Spectral characteristics of light-curing units and dental adhesives
- Synthesis and evaluation of adamantane-containing fluorinated block copolymers for resist modifiers in immersion lithography
- Fine pattern transfer of functional organic polymers by nanoimprint
- Dependence of de-molding force on process conditions in UV nanoimprint
- Direct photo-patterning of poly(3-hexylthiophene)
- Effect of molecular weights of 193nm resist polymers on the negative tone development process
- Fabrication of scaffold for cell adhesion on plasma-irradiated polystyrene
- Dissolution kinetics in chemically amplified EUV resist
- Fabrication process and estimation of organic alloy films using single-evaporation source of the mixture of two hole-transport materials
- Immobilization of proteins onto the self-assembled phospholipid layer fabricated by plasma-assisted method
- Determination of optimum thermalization distance based on trade-off relationship between resolution, line edge roughness and sensitivity of chemically amplified extreme ultraviolet resists
- Theoretical study on reactivity of photoacid generators for EUV lithography
- A study on micro-scale flow behavior of thermoplastic polymeric material