Recent development in molecular resists for extreme ultraviolet lithography
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概要
The Conference of Photopolymer Science and Technology | 論文
- A study on micro-scale flow behavior of thermoplastic polymeric material
- Theoretical study on reactivity of photoacid generators for EUV lithography
- Determination of optimum thermalization distance based on trade-off relationship between resolution, line edge roughness and sensitivity of chemically amplified extreme ultraviolet resists
- Immobilization of proteins onto the self-assembled phospholipid layer fabricated by plasma-assisted method
- Fabrication process and estimation of organic alloy films using single-evaporation source of the mixture of two hole-transport materials