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The Conference of Photopolymer Science and Technology | 論文
- A comprehensive review of EUV resist materials and processing at selete
- EUV interference lithography for 1X nm
- Soluble highly heat resistant aromatic polyimides
- Application of 2,5-dihydroxybenzoic acid as a fluorescent probe to the clarification of microenvironment in hydrogels of biopolymers
- The cocrystallization process of syndiotactic polystyrene with photo-functional molecules revealed by PFR method
- Directed self-assembly with density multiplication of cage silsesquioxane-containing block copolymer via controlled solvent annealing
- Reworkable resin using thiol-ene system
- Direct and sensitized photolysis of cyclic iodine compounds as photo-acid generator
- Production by photocurable resin of micro fastener which realizes highly precise positioning and conductive connection of devices
- Nanofabrication of sulfonated polystyrene-g-FEP with silver ion (Ag[+]) using ion beam direct etching and reduction
- Plasma damage recovery of organic low-k material
- High-sensitivity EUV resists based on tetrafluoroethylene contained fluoropolymers
- Functionalized cyclohexyl methacrylate based copolymers for negative resist
- An evaluation of ion implantation for LWR improvement in EUV lithography
- Surface chemistry of fluorine lyophobic resist
- Synthesis and characterization of triphenylamine-based organic photorefractive glasses
- Grafting of polyelectrolyte on porous substrate by plasma-induced polymerization
- Influence of perylene doping on performance of organic solar cells based on P3HT:PCBM blend
- EUVL challenges towards 1x nm generation
- Effects of UV crosslinking under high temperature on the refractive indices and aggregation structures of benzophenone-containing polyimides