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The Conference of Photopolymer Science and Technology | 論文
- Fabrication of anti-reflection structure using photo-curable polymer
- Enabling EUV materials introduction: an evolutionary process
- Transparent roll mold fabrication method and transfer to photo-curable polymer
- Material development for ArF immersion resist extension
- Borate salts as coinitiators in photoinitiating systems for laser imaging
- Positive-tone pattern formation from vinyl polymers with maleimide group by reaction development patterning
- Organic gas sorption on plasma-polymerized allylamine films coated with quartz crystal microbalance
- Characteristics of liquid marbles formed with plasma-treated hydrophobic cellulose powder
- Time dependent behavior of chemically amplified resist characterized under sub-millisecond post exposure bake
- Novel photosensitive transparent heat stable coatings
- Development of low reflectivity and high resolution negative-tone photoresist
- Lithography and chemical modeling of acid amplifiers for use in EUV photoresists
- Photoinduced surface relief grating formation using mixed amorphous films of molecular materials: 4-〔4'-stearoyloxybiphenyl-4-yl(biphenyl-4-yl)-amino〕azobenzene-4,4',4"-tris〔3-methylphenyl-(phenyl)amino〕triphenylamine system
- High temporal resolution measurements of shrinkage characteristics of UV nanoimprint resin
- Novel material development for EUV resist towards sub-20nm half pitch
- Laser scan lithography onto fine pipes and wires with sub-100-μm diameters
- PAG and quencher effects on DBARC performance
- Important challenge for optical lithography extension utilizing double patterning process
- New transparent composite films based on glass cloth reinforced polyimides
- Rational approach for improving optical and mechanical properties of transparent polyimide for FPC substrate