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The Conference of Photopolymer Science and Technology | 論文
- Preparation of Hydrophilic Polymer Thin Films on Polytetrafluoroethylene by Plasma-Solution Interface Reaction
- Observation of Swelling Behavior of ArF Resist during Development by using QCM Method (2)
- EUV Resist Materials for 16 nm and below Half Pitch Applications
- Simultaneous formation of donor-acceptor chromophores and cross-linking for electro-optic polymer materials
- Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers
- Pattern Size Effects on Demolding Force for Imprint Process
- Blush Resistance of Polyimide Coating Fluids
- EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner
- Syntheses of Solution-Processable Arylamine Derivatives and Their Application to Organic Light Emitting Devices
- Low-temperature Curable Positive-tone Photosensitive Polyimide Coatings
- Blazed Surface Relief Formation in Azobenzene-Containing Polymeric Films by Asymmetric Polarization Holography
- Transfer of Relatively Large Microstructures on Polyimide Films using Thermal Nanoimprinting
- Depth Dependence of Time Delay Effect on Hydrogen Silsesquioxane (HSQ) Resist Layers
- Mid-end Process Technologies for Advanced Packaging of LSI Devices
- Packaging Substrate Applications of Ultra Low CTE Polyimide
- Advances in Low Diffusion EUV Resists
- Performance of Alq-based Organic Light-Emitting Diode Fabricated under Light Irradiation
- UV-based Nanoimprint Lithography : Toward Direct Patterning of Functional Polymers
- Synthesis of Calixresorcinarene Derivatives with Cross-linking units and Evaluation of Lithographic Performance
- High Efficient Photoinitiator of Hexaphenylbisimidazole Derivatives with Substituents in the 2-Phenyl Ring