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表面分析研究会 | 論文
- Si wafer surface etched by water droplet cluster ion analyzed with SEM, SPM and XPS (Proceedings of PSA-07 (International Symposium on Practical Surface Analysis) November 25-28, 2007, Kanazawa, Japan)
- Theoretical analysis of Auger electron spectra of 2nd periodic element containing substances,
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- 粉体の表面分析用試料ホルダーとピンホール・マスク穴あけ治具の作成
- Recent Developments and Applications in AES and XPS
- Absolute Electron Energy Analyzer (Proceedings of the International Symposium on New Trends and Possibilities of Surface Analysis--Towards the Analysis of Nano-structured Materials)
- Historical Auger Electron Spectroscopy(2)
- 衛生陶器釉薬の表面分析
- Theoretical study of plasmon loss peaks in core-level photoemission spectra: energy and angular dependence (Proceedings of PSA-07 (International Symposium on Practical Surface Analysis) November 25-28, 2007, Kanazawa, Japan)
- Automatic Background Estimation of Spectra
- TASSAのたまご: Guide to some methods for detecting peaks in X-ray photoelectron spectroscopy and Auger electron spectroscopy
- 実用電子分光講座 電子ビーム照射に伴う絶縁物試料の帯電現象の時間的変化
- 話題 XPS元素SOMマップによるデータマイニング(データ発掘)
- Low damage etching of polymer materials for depth profile analysis using large Ar cluster ion beam (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- In-depth profile of Hf-based gate insulator films on Si substrates studied by angle-resolved photoelectron spectroscopy using synchrotron radiation (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-0
- 講義資料 イオンスパッタリングによるInPの損傷について
- Use of Low Energy Ions for Removal of Damaged Layer of Cross-sectioned Specimen Prepared by Focused Ion Beam
- Sputter depth profiling by SIMS: calibration of SIMS depth scale using multi-layer reference materials (Extended abstracts book of the International Workshop for Surface Analysis and Standardization '09 (iSAS-09))
- Quantitative Measurement of Arsenic Implant Dose by SIMS
- The Degradation of Perfluorinated Organic Thin Film During XPS Measurement