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表面分析研究会 | 論文
- Interdiffusion at Ge/Si Intefaces Studied with AES Depth Profiling
- Invited, review: 45 years in Monte Carlo simulation for microbeam analysis: a personal retrospective review (Proceedings of the 5th international symposium on practical surface analysis, PSA-10 and 7th Korea-Japan international symposium on surface analys
- 走査型プローブ顕微鏡の標準化と校正用標準に関する最近の研究動向
- 弾性散乱背面電子によるAESエネルギー校正法:10〜1200eV/15meV(改良したCMAを用いて)
- 電子検出・計測の原理と実際 (特集:VAMAS-SCA Japan復刻版(1989,1994)) -- (実用電子分光法講座(1994年1月))
- Common Data Processing System Version6の紹介
- COMPRO Version6 使用方法(1)
- COMPRO Version6 使用方法(2完)
- 解説 表面分析の国際標準化の現状--ISOとVAMAS
- 正しいスペクトルを得るために (特集:VAMAS-SCA Japan復刻版(1989,1994)) -- (実用電子分光法講座(1994年1月))
- データ処理に必要な関数の基礎 (特集:VAMAS-SCA Japan復刻版(1989,1994)) -- (実用電子分光法講座(1994年1月))
- 掲示板 ノイズの振る舞いの定量的表現(プロジェクト化の検討)
- Determination of the differential surface excitation parameter from experimental REELS data (Proceedings of the International Symposium on New Trends and Possibilities of Surface Analysis--Towards the Analysis of Nano-structured Materials)
- Sputter Etching Rate Ratio of Si to SiO2 using Mesh-Replica Method
- Growth and trends in auger electron spectroscopy and X-ray photoelectron spectroscopy: review, invited (Proceedings of PSA-07 (International Symposium on Practical Surface Analysis) November 25-28, 2007, Kanazawa, Japan)
- Dopant profiling on 4H silicon carbide P[+]N junction by scanning probe and secondary electron microscopy (Proceedings of PSA-07 (International Symposium on Practical Surface Analysis) November 25-28, 2007, Kanazawa, Japan)
- Perfluorosilanized Aluminum Oxide Surfaces (Special Issue on Quantitative Surface Chemical Analysis in honor of Kazuhiro Yoshihara)
- Determination of the Depth Scale in Sputter Depth Profiling(The Sputtered Depth in Depth Profiling)
- 講義 Progress in Quantitative Sputter Depth Profiling using the MRI-model
- Surface Analysis of Oxide Glass Surfaces: the Relationship between Atomic Charges and XPS Chemical Shifts
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