Formation of LaSi_<2-x> Layers on Si by High-Current La Ion Implantation
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-05-15
著者
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Liu Bai
Advanced Materials Laboratory Department Of Materials Science And Engineering Tsinghua University
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Liu B
Tsinghua Univ. Beijing Chn
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TANG Xiao
Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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CHENG Xiang
Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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WANG Run
Advanced Materials Laboratory, Department of Materials Science and Engineering, Tsinghua University
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Tang Xiao
Advanced Materials Laboratory Department Of Materials Science And Engineering Tsinghua University
関連論文
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- Formation of LaSi2-x Layers on Si by High-Current La Ion Implantation