A Dual BARC method for Lithography and Etch for Dual Damascene with Low K

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-05-15

著者

• Bliznetsov Vladimir

  Institute Of Microelectronics

• Samudra Ganesh

  National University Of Singapore

• MUKHERJEE-ROY Moitreyee

  Institute of Microelectronics

関連論文

• A Dual BARC method for Lithography and Etch for Dual Damascene with Low K
• Eliminating Sidewall Damage During Etch Process for Ultra Low-$k$ Film
• A Dual BARC method for Lithography and Etch for Dual Damascene with Low $K$

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