Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

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概要

• 論文の詳細を見る

著者

• SUDA Yoshiaki

  Sasebo National College of Technology

• KAWASAKI Hiroharu

  Sasebo National College of Technology

• OHSHIMA Tamiko

  Sasebo National College of Technology

• Yagyu Yoshihito

  Sasebo National College of Technology, 1-1 Okishin, Sasebo, Nagasaki 857-1193, Japan

• Taniyama Daichi

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

• Ihara Takeshi

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

• Arafune Kento

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

関連論文

• パルスレーザデポジション法による二酸化チタン光触媒薄膜の作製
• Optical Emission Spectroscopy of Low-Discharge-Power Magnetron Sputtering Plasmas Using Pure Tungsten Target
• Effects of Surface Coating on Cylinder Rods Prepared Using Sputtering Deposition Method with Modulated Magnetic Field
• Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target
• Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

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