Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target

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概要

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• Titanium-based functional thin films were prepared by a sputtering deposition method using a metal powder target, and the electron density and temperature of the processing plasma were investigated. The electron density of the plasma, measured by a probe method, when using a powder target was higher than that when using a bulk target. The deposition rate when using a powder target was also higher than that in the case of a bulk target. These results may be due to the net-cathode area of the powder target being larger than that of the bulk target. X-ray photoelectron spectroscopy, X-ray diffraction measurements, and atomic force microscopy images of the films prepared using the Ti powder target indicated nearly the same properties as those of films prepared using a Ti bulk target, and the prepared films are oxide. These results suggest that TiO<inf>2</inf>thin films can be prepared using a Ti powder target and that the quality is almost the same as those of films prepared using a Ti bulk target.

• 2013-11-25

著者

• SUDA Yoshiaki

  Sasebo National College of Technology

• KAWASAKI Hiroharu

  Sasebo National College of Technology

• OHSHIMA Tamiko

  Sasebo National College of Technology

• Yagyu Yoshihito

  Sasebo National College of Technology, 1-1 Okishin, Sasebo, Nagasaki 857-1193, Japan

• Kawasaki Hiroharu

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

• Taniyama Daichi

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

• Ihara Takeshi

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

• Arafune Kento

  Sasebo National College of Technology, Sasebo, Nagasaki 857-1193, Japan

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• Optical Emission Spectroscopy of Low-Discharge-Power Magnetron Sputtering Plasmas Using Pure Tungsten Target
• Effects of Surface Coating on Cylinder Rods Prepared Using Sputtering Deposition Method with Modulated Magnetic Field
• Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target
• Plasma Processing of Functional Thin Films by Sputtering Deposition Using Metal-Based Powder Target (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

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