High-Temperature Annealing by Subatmospheric-Pressure Radio-Frequency Capacitively Coupled Plasma (Special Issue : Dry Process)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Miyake Masatoshi

  Central Research Laboratory, Hitachi, Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan

関連論文

• Effects of Mask and Necking Deformation on Bowing and Twisting in High-Aspect-Ratio Contact Hole Etching
• High-Temperature Annealing by Subatmospheric-Pressure Radio-Frequency Capacitively Coupled Plasma (Special Issue : Dry Process)

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