Surface Relief Formation in Azobenzene-Containing Polymers Using 325nm Holography

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Nishioka Emi

  Department Of Materials Science And Chemistry Graduate School Of Engineering University Of Hyogo

関連論文

• Blazed Surface Relief Formation in Azobenzene-Containing Polymeric Films by Asymmetric Polarization Holography
• Surface Relief Formation in Azobenzene-Containing Polymers Using 325nm Holography
• Blazed Surface Relief Formation in Azobenzene-Containing Polymeric Films by Asymmetric Polarization Holography
• Surface Relief Formation in Azobenzene-Containing Polymers Using 325 nm Holography
• Transitional Reorientation and Rotation of Molecules during Vector Holographic Recording in Azobenzene-Containing Polymeric Films
• Intensity and Polarization Modulation Holographic Recordings and Vector Holograms Using Inhomogeneous Polarized Beams

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