The Role of Rare Earth Metals on Effective Work Function Modulation of Nickel Fully-Silicided Gate/High-k Dielectric Stacks for n-Channel Metal Oxide Semiconductor Device Applications
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Misra Veena
Department Of Electrical And Computer Engineering North Carolina State University
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Lee Bongmook
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, NC 27695, U.S.A.
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Novak Steven
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, NC 27695, U.S.A.
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Biswas Nivedita
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, NC 27695, U.S.A.
関連論文
- Integration of Plasma-Assisted and Rapid Thermal Processing for Low-Thermal Budget Preparation of Ultra-Thin Dielectrics for Stacked-Gate Device Structures
- The Role of Rare Earth Metals on Effective Work Function Modulation of Nickel Fully-Silicided Gate/High-k Dielectric Stacks for n-Channel Metal Oxide Semiconductor Device Applications