Radio Frequency Plasma Transition Caused by Gas Puffing and/or Direct Current Biasing Using Multiturn Internal Antenna (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Yamauchi Toshihiko
Quantum Beam Science Directorate, Japan Atomic Energy Agency, 2-4 Shirakata Shirane, Tokai, Ibaraki 319-1195, Japan
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Kobayashi Seiji
Quantum Beam Science Directorate, Japan Atomic Energy Agency, 2-4 Shirakata Shirane, Tokai, Ibaraki 319-1195, Japan
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Sugibayashi Hideyuki
Advanced Institute of Industrial Technology, Shinagawa, Tokyo 140-0011, Japan
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Tachibana Toshiyuki
Ibaraki National College of Technology, Hitachinaka, Ibaraki 312-8508, Japan
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Naitoh Shunya
Faculty of Engineering, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Kanno Yoshinori
Advanced Institute of Industrial Technology, Shinagawa, Tokyo 140-0011, Japan
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Hiruta Toshihito
Quantum Beam Science Directorate, Japan Atomic Energy Agency, Tokai, Ibaraki 319-1195, Japan
関連論文
- Radio Frequency Plasma Transition Caused by Gas Puffing and/or Direct Current Biasing Using Multiturn Internal Antenna (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)
- Advanced Ceramics Synthesized by Inductively Coupled Plasma with Inner RF Antenna
- Behavior of Transition into Inductively Coupled Plasma Mode with Internal Radio Frequency Multiturn Antenna