Synchrotron radiation photoemission study of Ge3N4/Ge structures formed by plasma nitridation (Special issue: Dielectric thin films for future electron devices: science and technology)

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Okamoto Gaku

  Graduate School Of Engineering Osaka University

• Kutsuki Katsuhiro

  Graduate School Of Engineering Osaka University

関連論文

• Characteristics of Pure Ge_3N_4 Dielectric Layers Formed by High-Density Plasma Nitridation
• Synchrotron radiation photoemission study of Ge3N4/Ge structures formed by plasma nitridation (Special issue: Dielectric thin films for future electron devices: science and technology)

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