Formation of WO3 reduction coloring thin film using a combination sputtering method featuring radio-frequency oxygen plasma irradiation
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- Preparation of TiO_2 Thin Film Photocatalyst by High-rate Low-temperature Sputtering Method
- Formation of WO3 reduction coloring thin film using a combination sputtering method featuring radio-frequency oxygen plasma irradiation
- Formation of WO_3 Reduction Coloring Thin Film Using a Combination Sputtering Method Featuring Radio-Frequency Oxygen Plasma Irradiation