Dynamics of radical cation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (Special issue: Microprocesses and nanotechnology)
スポンサーリンク
概要
著者
-
Sumiyoshi Takashi
Division Of Quantum Energy Engineering Graduate School Of Engineering Hokkaido University
-
FUJIYOSHI Ryoko
Division of Quantum Energy Engineering, Graduate School of Engineering, Hokkaido University
-
Tagawa Seiichi
CREST/JST, Kawaguchi, Saitama 332-0012, Japan
-
Okamoto Kazumasa
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
-
Kozawa Takahiro
CREST/JST, Kawaguchi, Saitama 332-0012, Japan
-
Tajima Yasuharu
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
関連論文
- Pulse Radiolysis-Laser Flash Photolysis Studies of Dipheny1 Sulfide in Liquid Halocarbons
- Dynamics of radical cation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (Special issue: Microprocesses and nanotechnology)
- Photochemistry of π-Complexes of Chlorine Atom with Methyl- and Ethyl-Substituted Benzenes
- Pulse Radiolysis-Laser Flash Photolysis Study of Xanthene in 1,2-Dichloroethane/Carbon Tetrachloride
- Quantum Yields of Intramolecular Hydrogen Abstraction Induced by Laser Flash Photolysis of Arene/Cl π-Complexes
- Laser-flash Photolysis of DMSO-Cl Complexes in Dimethyl Sulfoxide/CCl_4 Mixed Solvent
- Stroboscopic Picosecond Pulse Radiolysis Studies of the Short Lived Cation Produced in Butylhalides
- Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist
- Deprotonation of Poly(4-hydroxystyrene) Intermediates : Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist (Special Issue : Microprocesses and Nanotechnology)