Okamoto Kazumasa | Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
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概要
- Okamoto Kazumasaの詳細を見る
- 同名の論文著者
- Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japanの論文著者
関連著者
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Sumiyoshi Takashi
Division Of Quantum Energy Engineering Graduate School Of Engineering Hokkaido University
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FUJIYOSHI Ryoko
Division of Quantum Energy Engineering, Graduate School of Engineering, Hokkaido University
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Tagawa Seiichi
CREST/JST, Kawaguchi, Saitama 332-0012, Japan
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Okamoto Kazumasa
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
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Kozawa Takahiro
CREST/JST, Kawaguchi, Saitama 332-0012, Japan
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Matsuda Ryo
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
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Yamamoto Hiroki
CREST/JST, Kawaguchi, Saitama 332-0012, Japan
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Fujiyoshi Ryoko
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
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Sumiyoshi Takashi
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
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Tajima Yasuharu
Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University, Sapporo 060-8628, Japan
著作論文
- Dynamics of radical cation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (Special issue: Microprocesses and nanotechnology)
- Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist
- Deprotonation of Poly(4-hydroxystyrene) Intermediates : Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist (Special Issue : Microprocesses and Nanotechnology)