Study on approaches for improvement of EUV-resist sensitivity

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概要

• 論文の詳細を見る

著者

• Takahashi Hidenori

  Fujifilm Corp. Shizuoka Jpn

• Tarutani Shinji

  Fujifilm Corp. Shizuoka Jpn

関連論文

• Study on approaches for improvement of EUV-resist sensitivity
• A resist material study for LWR and resolution improvement in EUV lithography
• Reduction of the outgassing segments and LWR improvement for the next generation EUV lithography
• Characterizing polymer bound PAG type EUV resist

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