A resist material study for LWR and resolution improvement in EUV lithography

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概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Takahashi Hidenori

  Fujifilm Corp. Shizuoka Jpn

関連論文

• Study on approaches for improvement of EUV-resist sensitivity
• A resist material study for LWR and resolution improvement in EUV lithography
• Characterizing polymer bound PAG type EUV resist

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