Reduction of the outgassing segments and LWR improvement for the next generation EUV lithography

スポンサーリンク

概要

• 論文の詳細を見る
• Technical Association of Photopolymers, Japanの論文

著者

• Kamimura Sou

  Fujifilm Corp. Shizuoka Jpn

• Tarutani Shinji

  Fujifilm Corp. Shizuoka Jpn

関連論文

• Study on approaches for improvement of EUV-resist sensitivity
• Reduction of the outgassing segments and LWR improvement for the next generation EUV lithography
• Characterizing polymer bound PAG type EUV resist

スポンサーリンク