Synthesis of Polysilane-Acrylic Copolymers by Photopolymerization and Their Application to Positive Resists for EB Lithography
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概要
著者
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MATSUKAWA Kimihiro
Osaka Municipal Technical Research Institute
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Matsukawa K
Osaka Municipal Technical Research Institute
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Matsuura Y
Osaka Municipal Technical Res. Inst. Osaka Jpn
関連論文
- Photoluminescence Anisotropy of Ultraviolet-Light-Irradiated Organic Polysilane-Silica Hybrid Thin Films : Optical Properties of Condensed Matter
- Surface Modification of Organic-Inorganic Hybrid Insulator for Printable Organic Field-effect Transistors
- Fabrication and characterization of poly(3-hexylthiophene)-based field-effect transistors with silsesquioxane gate insulators
- Analysis of Substrate Effect in Chemically Amplified Resist
- Fabrication of Polysilane-Silica Hybrid Thin Films with Controlled Refractive Index
- Preparation of Polysilane/Gold Bilayer Using Polysilane/2-(Methylthio)ethyl Methacrylate Block Copolymer
- Change in Surface and Optical Properties of Polysilane-silica Hybrid Thin Films by UV Irradiation
- Development of Photocuring Acrylic/silica Organic-Inorganic Hybrid for Negative Resists
- Photocuring of Acrylic-Silica Organic-Inorganic Hybrid
- Acryl Polymer-Silica Hybrid for Electron Beam Resist
- Organic-Inorganic Hybrid Type Electron Beam Resist
- Synthesis of Polysilane-Acrylic Copolymers by Photopolymerization and Their Application to Positive Resists for EB Lithography
- Polymer Particles Incorporating ZrO_2 Nanoparticles Prepared by Miniemulsion Polymerization
- Preparation and Properties of Organic-Inorganic Hybrid Thin Films Containing Polysilane Segments from Polysilane-methacrylate Copolymers
- Preparation of Porous Titania Thin Films from Polysilane-Titania Hybrid by UV Irradiation
- Surface Properties of Polysilane Copolymers with Siloxane Pendant Groups