Improved Oxide Etching by the Enhanced Inductively Coupled Plasma (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))

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概要

• 論文の詳細を見る
• 電子情報通信学会の論文
• 2001-07-05

著者

• Cho S.-b.

  Inha University Incheon Korea

• Song Ho-young

  M-parc School Of Information And Communication Engineering Inha University

• Park Se-geun

  M-parc School Of Information And Communication Engineering Inha University

• Song H.-y.

  Inha University Incheon Korea

• Park S.-g.

  Inha University Incheon Korea

関連論文

• Effect of Time-varying Axial Magnetic Field on High Aspect Ratio SiO_2 Etching in an Inductively Coupled Plasma
• Effect of Time-varying Axial Magnetic Field on High Aspect Ratio SiO_2 Etching in an Inductively Coupled Plasma
• Improved Oxide Etching by the Enhanced Inductively Coupled Plasma
• Improved Oxide Etching by the Enhanced Inductively Coupled Plasma
• Improved Oxide Etching by the Enhanced Inductively Coupled Plasma (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))

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