A New Chemical Mechanical Polishing Method Using the Frozen Etchant Pad (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))

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概要

• 論文の詳細を見る
• 電子情報通信学会の論文
• 2001-07-05

著者

• Oh Youn-jin

  Dept.of Chemical Engineering Sungkyunkwan University

• Chung Chan-hwa

  Dept.of Chemical Engineering Sungkyunkwan University

• Park Gyung-soon

  Dept.of Chemical Engineering Sungkyunkwan University

関連論文

• A NEW CHEMICAL MECHANICAL POLISHING METHOD USING THE FROZEN ETCHANT PAD
• A NEW CHEMICAL MECHANICAL POLISHING METHOD USING THE FROZEN ETCHANT PAD
• A New Chemical Mechanical Polishing Method Using the Frozen Etchant Pad (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))

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