The Effect of Plasma Treatment on the Physical Properties of SrRuO3 Films on SrTiO3 Substrate
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概要
- 論文の詳細を見る
The transport properties of as-deposited and plasma-treated SrRuO3 thin films grown on SrTiO3(001) substrates were investigated. The SrRuO3 thin films were treated with two different kinds of plasma gases: O2 and H2. The difference in the transport properties of the two plasma-treated SrRuO3 films was explained by the different oxygen vacancy concentration, based on different values for the out-of-plane lattice constant. This oxygen vacancy was significantly reduced by recovery annealing under high oxygen pressure.
- 2013-01-15
著者
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KIM Jinhee
Korea Research Institute of Standards and Science
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Park Ji-yong
Department Of Electrical Engineering Ucla:presently With Advanced Power Technology
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Cho Jaewon
Department Of Electrophysics Kwangwoon University
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Park Bae
Division Of Quantum Phases And Devices Department Of Physics Konkuk University
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Park Bae
Division of Quantum Phases and Devices, Department of Physics, Konkuk University, Seoul 143-701, Korea
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Shim Seung
Korea Research Institute of Standards and Science, Daejeon 305-340, Korea
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Park Ji-Yong
Department of Physics and Division of Energy Systems Research, Ajou University, Suwon, Gyeonggi 443-749 Korea
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Kurnia Fran
Department of Physics, Hankuk University of Foreign Studies, Yongin, Gyeonggi 449-791, Korea
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Tambunan Octolia
Department of Physics, Hankuk University of Foreign Studies, Yongin, Gyeonggi 449-791, Korea
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Lee Bowha
Department of Physics, Hankuk University of Foreign Studies, Yongin, Gyeonggi 449-791, Korea
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Choi Jinsung
Department of Electrophysics, Kwangwoon University, Seoul 139-701, Korea
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Jung Chang
Department of Physics, Hankuk University of Foreign Studies, Yongin, Gyeonggi 449-791, Korea
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Kim Jinhee
Korea Research Institute of Standards and Science, Daejeon 305-340, Korea
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Cho Jaewon
Department of Electrophysics, Kwangwoon University, Seoul 139-701, Korea
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