Effect of Direct Current Power to Ti-Target on the Composition, Structure and Characterization of the Ti (0--2.36 at. %), Al Codoped ZnO Sputtering Thin Films

スポンサーリンク

概要

• 論文の詳細を見る

• Transparent conductive Ti, Al codoped ZnO (TAZO) films were prepared on glass substrate by three-target magnetron sputtering system in this work. The glass substrate was heated to 200 °C, and the working pressure in the chamber was at 5\times 10^{-2} Torr. In the process of sputtering, pure Ti target was bombarded by direct current varying in the power at 0, 20, 30, and 40 W; however, the pure Al target and pure ZnO target were bombarded by radio frequency power fixed at 100 W. After sputtering for 150 min, the thickness of the films was measured to be about 700 nm varying in Ti-content. The surface morphology and cross section of the films were examined by using field emission scanning electron microscope (FE-SEM) and their composition was analyzed with attached energy dispersive spectroscopy (EDS). The Ti-content of the films was found to increase with increasing the DC power in the order: 0 at. % (0 W) < 0.59 at. % (20 W) < 1.35 at. % (30 W) < 2.36 at. % (40 W). Analysis of X-ray diffraction (XRD) indicated that all the films belong to wurtzite structure textured on (0002). Through examination by atomic force microscopy (AFM), the films revealed their average surface roughness (R_{\text{a}}) decreased from 10.74 to 5.40 nm with increasing the Ti-content. Surface composition and depth profile of the films were examined by X-ray photoelectron spectroscopy (XPS). The electrical resistivity of the films, determined by four-point probe, was in the range from 0.93\times 10^{-3} \Omega cm (with 0.59 at. % Ti) to 8.34\times 10^{-3} \Omega cm (with 2.36 at. % Ti). The average optical transmittance of the films analyzed by UV--vis light was higher than 85% in visible spectra.

• 2013-01-25

著者

• Lin Jing-chie

  Department Of Mechanical Engineering National Central University

• Peng Kun-Cheng

  Department of Materials Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan

• Peng Kun-Cheng

  Department of Materials Engineering, Mingchi University of Technology, Taishan, New Taipei City 243, Taiwan

• Wu Jing-Nan

  Department of Mechanical Engineering, National Central University, Zhongli, Taoyuan 320, Taiwan

• Tseng Chun-An

  Department of Mechanical Engineering, National Central University, Zhongli, Taoyuan 320, Taiwan

関連論文

• Effects of Fe Content on Microstructure and Mechanical Properties of A206 Alloy
• Annealing Behavior of Nickel Electrodeposited from Sulfamate Bath at Different Temperatures
• Effect of Bath Temperature on Microstructure of Sulfamate Nickel Electrodeposits
• Mechanical Properties of Al-11%Si Casting Alloys Containing Trace Be and Sr
• Effect of Direct Current Power to Ti-Target on the Composition, Structure and Characterization of the Ti (0--2.36 at. %), Al Codoped ZnO Sputtering Thin Films
• Green Fluorescence of Mn-Doped Zn2SiO4 Thin Film Enhanced by Surface Plasmon of Nano-Silver Coating
• Mn-Doped Zn
• Annealing Effect on the Microstructure and Optical Characterization of Zn
• Annealing Effect on the Microstructure and Optical Characterization of Zn₂SiO₄ Thin Film Sputtered on Quartz Glass (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials)

スポンサーリンク