Performance Improvement of Low-Temperature Polycrystalline Silicon Thin-Film Transistors with Fluorinated Silicate Glass Drive-In Masking Layer
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概要
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This study investigated a low-temperature polycrystalline silicon thin-film transistor (LTPS TFT) with a fluorinated silicate glass (FSG) drive-in masking layer on the channel layer to improve the device's performance. The FSG layer can also be patterned as a masking layer to define the source and drain (S/D) regions, and the activation of S/D regions and fluorine passivation treatment can be accomplished simultaneously. Fluorine atoms can diffuse from the FSG drive-in masking layer into the bulk channel to passivate the trap states, resulting in a considerable improvement of the electrical characteristics of the device. This demonstrated that the field-effect mobility increased from 10.9 to 30.4 cm2 V-1 s-1, and the on/off current ratio increased from 8.9 \times 10^{4} to 10.4 \times 10^{5}. The proposed scheme is simple, economical, and suitable for mass production of large-sized displays.
- 2012-10-25
著者
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Lin Yi-yan
Department Of Electronic Engineering National Taiwan University Of Science And Technology
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Fan Ching-lin
Graduate Institute Of Electro-optical Engineering National University Of Science And Technology
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Lin Wei-Chun
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan
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Wang Shou-Kuan
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan
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Shang Min-Chi
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan
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Fan Ching-Lin
Graduate Institute of Electro-Optical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan
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Lin Yi-Yan
Department of Electronic Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan
関連論文
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- Effects of Rapid Thermal Annealing on Poly-Si TFT with Different Gate Oxide Thickness
- A New Low Temperature Polycrystalline Silicon Thin Film Transistor Pixel Circuit for Active Matrix Organic Light Emitting Diode
- Performance Improvement of Low-Temperature Polycrystalline Silicon Thin-Film Transistors with Fluorinated Silicate Glass Drive-In Masking Layer
- Improvement in Characteristics of Low-Temperature Polycrystalline Silicon Thin Film Transistors with High-Efficiency and Low-Damage N2 Plasma Pretreatment