Large-Area Nanotemplate Process and Its Application to Roll Imprint
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概要
- 論文の詳細を見る
This study developed a stitching process for unit element nanotemplates based on step and repeat imprinting for use in enlarged soft mold fabrication. This mold was subsequently used for the custom-developed roll-to-plate UV nanoimprint process. The distinctive features of roll UV imprinting include the following: (1) the UV source is embedded within a roll mold made of quartz so that it can illuminate a resist coated on either a transparent or an opaque substrate, (2) the press-contact between the resist and soft mold wrapped around the quartz mold was designed to synchronize the rolling operation with the linear motion of the substrate, which helped minimize the residue thickness, and (3) a compressed pneumatic force was applied along the contact line of the roll imprint, which helped attenuate any possible level mismatch on the stitched mold surface.
- 2012-06-25
著者
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Lee Ji-hye
Department Of Food Technology School Of Life Sciences And Biotechnology Korea University
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Jeong Jun-Ho
Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
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Lee Soon-Won
Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
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Lee Eung-Sug
Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
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Choi Jun-Hyuk
Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
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Choi Dae-Geun
Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
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Lee Ji-Hye
Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
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