Fabrication of Nanocone Subwavelength Antireflection Structures on Quartz Substrates
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概要
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This study combined self-assembled nanosphere lithography (SANL) and inductively coupled plasma reactive ion etching (ICP-RIE) for fabricating orderly arranged quartz nanocone arrays. We reported a simple process for successfully fabricating quartz subwavelength structure (SWS) substrate, achieving broadband antireflection (AR) and increasing the transmittance of incident light across the quartz glass. This combined process arranged a monolayer of nanospheres onto 2\times 2 cm2 test specimen. In addition, we evaluated various etching times of ICP-RIE for producing SWS surfaces, which resulted in various specific surface areas for the quartz substrates. Consequently, smoothly tapered SWS surfaces with a width of 105 nm and a height of 190 nm could be produced on quartz wafer. This fabricated SWS decreased the surface reflectance to less than 6.75% in the visible light spectrum.
- 2012-06-25
著者
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Shiao Ming-hua
Instrument Technology Research Center National Applied Research Laboratories
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Su Jien-Yin
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan
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Tang Yu-Hsiang
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan
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Shiao Ming-Hua
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan
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Huang Mao-Jung
Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan
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