Effect of Dopant on Piezoelectric Properties of Lead-Free BiFeO<sub>3</sub>--BaTiO<sub>3</sub> Film
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概要
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To realize high-performance lead-free piezoelectric materials, we have selected BiFeO<sub>3</sub> as the rhomboheral phase material and BaTiO<sub>3</sub> as the tetragonal phase material, following the MPB mechanism of PZT. To further improve the piezoelectric properties of BiFeO<sub>3</sub>--BaTiO<sub>3</sub> (BFBT) thin films, we investigated the effect of dopant on the piezoelectric properties of BFBT. Considering both Shanon effective ionic radii and valence number, we have selected Sr2+ (BFBT--SrTiO<sub>3</sub>, abbreviated as BFBT-ST) and Nb5+ (abbreviated as BFBT-Nb) substitutions. BFBT-ST and BFBT-Nb films were epitaxially grown by pulsed laser deposition on an epitaxial SrRuO<sub>3</sub>/MgO/Si(100) substrate. The piezoelectric constant $d_{\text{33AFM}}$ is estimated from the slope of the maximum displacement and the maximum voltage strength by atomic force microscopy. Compared with 0.8BF0.2BT films with $d_{\text{33AFM}} = 65$ pm/V, the 0.8BF0.2BT--Nb2.5% films achieved $d_{\aku\text{33AFM}} = 78$ pm/V. The displacement curve of 0.8BF0.2BT--Nb2.5% became soft with the occurrence of a hysteresis shape, compared with that of 0.8BF0.2BT. Moreover, the $d_{\text{33AFM}}$ of 0.77BF0.13BT--0.1ST ($\text{BF/BT ratio}= 0.85/0.15$) was 83 pm/V, compared with the $d_{\text{33AFM}}$ (58 pm/V) of 0.85BF0.15BT. According to these results, we confirmed that the Sr2+ and Nb5+ substitutions improve the piezoelectric properties of BFBT.
- 2011-09-25
著者
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SASAKI Tsutomu
Research and Development Division, Kikkoman Corporation
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Sakashita Yukio
Research and Development Management Headquarters, FUJIFILM Corporation, Kaisei, Kanagawa 258-8577, Japan
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Sakashita Yukio
Research and Development Management Headquarters, FUJIFILM Corp., Minamiashigara, Kanagawa 250-0193, Japan
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Hirabayashi Yasutoshi
Research and Development Management Headquarters, FUJIFILM Corporation, Kaisei, Kanagawa 258-8577, Japan
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Kobayashi Hiroyuki
Research and Development Management Headquarters, FUJIFILM Corporation, Kaisei, Kanagawa 258-8577, Japan
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Sasaki Tsutomu
Research and Development Management Headquarters, FUJIFILM Corporation, Kaisei, Kanagawa 258-8577, Japan
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