Dynamic Characteristics of Laser-Assisted Discharge Plasmas for Extreme Ultraviolet Light Sources
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概要
- 論文の詳細を見る
This paper reports the dynamics of laser-assisted discharge plasmas for extreme ultraviolet (EUV) sources. A pulsed laser was focused on the tin cathode surface to form vapor jet across 5 mm long anode—cathode gap where pulsed power was applied later on. Comparison of time-resolved pinhole EUV imaging and high speed visible photography reveals that intensive EUV is emitted only from the neck of the hot plasma, which starts showing up near the laser spot on the cathode and moves away from the cathode. This movement of the neck plasma results in the enlargement of the EUV emissive region acting as its source.
- 2010-09-25
著者
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Akiyama Hidenori
Graduate School Of Science And Technology Kumamoto University
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Katsuki Sunao
Graduate School of Science and Technology, Kumamoto University
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Lu Peng
Graduate School Of Science And Technology Kumamoto University
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Lu Peng
Graduate School of Science and Technology, Kumamoto University, 39-1 Kurokami 2-chome, Kumamoto 860-8555, Japan
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Tomimaru Nobufumi
Graduate School of Science and Technology, Kumamoto University, 39-1 Kurokami 2-chome, Kumamoto 860-8555, Japan
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Ueno Takahisa
Graduate School of Science and Technology, Kumamoto University, 39-1 Kurokami 2-chome, Kumamoto 860-8555, Japan
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Katsuki Sunao
Graduate School of Science and Technology, Kumamoto University, 39-1 Kurokami 2-chome, Kumamoto 860-8555, Japan
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Akiyama Hidenori
Graduate School of Science and Technology, Kumamoto University, 39-1 Kurokami 2-chome, Kumamoto 860-8555, Japan
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