Internal Stress and Microstructure of Zinc Oxide Films Sputter-Deposited with Carbon Dioxide Gas

概要

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The internal stress and microstructure of ZnO films were investigated as a function of carbon dioxide (CO2) gas flow ratio [$\text{CO$_{2}$}/(\text{O$_{2}$}+\text{CO$_{2}$})$] during sputter deposition. The internal stress of the ZnO films decreased with increasing CO2 gas flow ratio. The carbon concentration in the films deposited using CO2 gas increased by up to 4.0 at. %. Furthermore, the ZnO films deposited without CO2 gas exhibited a preferred orientation of (002); however, the C-doped ZnO films exhibited random orientations. These findings suggest that the C atoms incorporated in the ZnO crystal lattice induce this random orientation, thereby relaxing the internal stress of C-doped ZnO films.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2010-06-25