Gas Adsorption Properties of Fluorocarbon Thin Films Prepared Using Three Different Types of RF Magnetron Sputtering Systems

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概要

• 論文の詳細を見る

• Fluorocarbon thin films were deposited onto a quartz crystal with a poly(tetrafluoroethylene) target using three different types of RF magnetron sputtering systems with strong, weak, and unbalanced magnetic fields. The adsorption properties of these thin films for water, ethanol, acetone, acetaldehyde, toluene, and methyl salicylate were evaluated using the quartz crystal microbalance (QCM) method in order to characterize the surface properties of these thin films. These thin films have low sensitivities to non-polar solvents that contain methyl and aromatic groups, and high sensitivities to polar solvents that contain carbonyl and hydroxyl groups. Chemical structures, especially, polar moieties in these fluorocarbon thin films would affect the gas adsorption properties.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2010-04-25

著者

• Iwamori Satoru

  Graduate School Of Natural Science And Technology Kanazawa University

• Yano Satoshi

  Graduate School of Bio-Applications and Systems Engineering, Tokyo University of Agriculture and Technology, Koganei, Tokyo 184-8588, Japan

• Satoshi Yano

  Graduate School of Natural Science and Technology, Kanazawa University, Kakumamachi, Kanazawa 920-1167, Japan

• Hasegawa Norihiko

  Graduate School of Natural Science and Technology, Kanazawa University, Kakumamachi, Kanazawa 920-1167, Japan

• Kazutoshi Noda

  National Institute of Advanced Industrial Science and Technology (AIST), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan

• Satoru Iwamori

  Graduate School of Natural Science and Technology, Kanazawa University, Kakumamachi, Kanazawa 920-1167, Japan

関連論文

• Investigation of Silver Oxidation Behavior under Active Oxygen Processing Utilizing the Quartz Crystal Microbalance Method
• Monitoring of Surface Treatment Effects on Sputter-coated Organic Film under Atomic Oxygen and Ultraviolet Irradiation
• Adsorption Properties of Thin Films Prepared by RF Sputtering with a Poly(biphenyltetracarboxylic dianhydride–paraphenylene diamine) Polyimide Target
• Gas Adsorption Properties of Fluorocarbon Thin Films Prepared Using Three Different Types of RF Magnetron Sputtering Systems
• Ultrasound Inverse Scattering Computed Tomography under the Angular Illumination Limitation

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