Efficiency Improvement of Silicon Solar Cells by Nitric Acid Oxidization
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概要
- 論文の詳細を見る
In this study, we investigate the effect of nitric acid oxidation on p-type silicon solar cells. The oxide layer on the surface of a p-type silicon substrate was grown under various growth times and temperatures while under nitric acid treatment. After 30 min of growth at 23 °C, an efficiency improvement of absolute 2% was obtained using our laboratory fabrication process.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2010-02-25
著者
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Yeng-Cheng Hu
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
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Wang Likarn
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 300, R.O.C.
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Likarn Wang
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
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Hu Yeng-Cheng
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
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Chiu Ming-Hui
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
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Jing-Long Tsai
No 22, Aly 1, Ln 67, Min-Tsu Rd, Hsinchu, Taiwan, R.O.C.
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Ming-Hui Chiu
Institute of Photonics Technologies, National Tsing Hua University, Hsinchu, Taiwan 30013, R.O.C.
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- Efficiency Improvement of Silicon Solar Cells by Nitric Acid Oxidization